JPH0470379B2 - - Google Patents
Info
- Publication number
- JPH0470379B2 JPH0470379B2 JP59267441A JP26744184A JPH0470379B2 JP H0470379 B2 JPH0470379 B2 JP H0470379B2 JP 59267441 A JP59267441 A JP 59267441A JP 26744184 A JP26744184 A JP 26744184A JP H0470379 B2 JPH0470379 B2 JP H0470379B2
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- rotating shaft
- rotating
- paddles
- motor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Manufacture Of Alloys Or Alloy Compounds (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP26744184A JPS61147826A (ja) | 1984-12-20 | 1984-12-20 | 合金製造装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP26744184A JPS61147826A (ja) | 1984-12-20 | 1984-12-20 | 合金製造装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61147826A JPS61147826A (ja) | 1986-07-05 |
JPH0470379B2 true JPH0470379B2 (en]) | 1992-11-10 |
Family
ID=17444883
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP26744184A Granted JPS61147826A (ja) | 1984-12-20 | 1984-12-20 | 合金製造装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61147826A (en]) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6990870B2 (en) | 2002-12-12 | 2006-01-31 | Molecular Imprints, Inc. | System for determining characteristics of substrates employing fluid geometries |
US7090716B2 (en) | 2003-10-02 | 2006-08-15 | Molecular Imprints, Inc. | Single phase fluid imprint lithography method |
US7122079B2 (en) | 2004-02-27 | 2006-10-17 | Molecular Imprints, Inc. | Composition for an etching mask comprising a silicon-containing material |
US7136150B2 (en) | 2003-09-25 | 2006-11-14 | Molecular Imprints, Inc. | Imprint lithography template having opaque alignment marks |
US7338275B2 (en) | 2002-07-11 | 2008-03-04 | Molecular Imprints, Inc. | Formation of discontinuous films during an imprint lithography process |
US7357876B2 (en) | 2004-12-01 | 2008-04-15 | Molecular Imprints, Inc. | Eliminating printability of sub-resolution defects in imprint lithography |
US7547398B2 (en) | 2006-04-18 | 2009-06-16 | Molecular Imprints, Inc. | Self-aligned process for fabricating imprint templates containing variously etched features |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0818112B2 (ja) * | 1987-07-22 | 1996-02-28 | 石川島播磨重工業株式会社 | 半凝固スラリ−からの薄板製造装置 |
JPH02166242A (ja) * | 1988-12-20 | 1990-06-26 | Suzuki Motor Co Ltd | 複合材料の製造方法 |
JPH02200745A (ja) * | 1989-01-27 | 1990-08-09 | Suzuki Motor Co Ltd | 金属基複合材料の連続製造装置 |
CN109513886A (zh) * | 2018-12-14 | 2019-03-26 | 珠海市润星泰电器有限公司 | 一种半固态浆料的制浆装置 |
CN113198983B (zh) * | 2021-04-23 | 2023-06-16 | 上海应用技术大学 | 一种介质冷却行星搅拌半固态浆料的制备方法和装置 |
CN113416858B (zh) * | 2021-07-04 | 2022-01-18 | 江苏威雅仕不锈钢制品有限公司 | 铝合金半固态浆料制备装置 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS559242U (en]) * | 1978-07-04 | 1980-01-21 | ||
JPS627383Y2 (en]) * | 1981-02-16 | 1987-02-20 | ||
JPS6113067Y2 (en]) * | 1981-02-17 | 1986-04-23 | ||
JPS6126363Y2 (en]) * | 1981-03-23 | 1986-08-07 | ||
JPS58190114U (ja) * | 1982-06-10 | 1983-12-17 | 株式会社北川鉄工所 | モルタルミキサ用撹拌羽根の自転公転比 |
-
1984
- 1984-12-20 JP JP26744184A patent/JPS61147826A/ja active Granted
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7338275B2 (en) | 2002-07-11 | 2008-03-04 | Molecular Imprints, Inc. | Formation of discontinuous films during an imprint lithography process |
US6990870B2 (en) | 2002-12-12 | 2006-01-31 | Molecular Imprints, Inc. | System for determining characteristics of substrates employing fluid geometries |
US7136150B2 (en) | 2003-09-25 | 2006-11-14 | Molecular Imprints, Inc. | Imprint lithography template having opaque alignment marks |
US7090716B2 (en) | 2003-10-02 | 2006-08-15 | Molecular Imprints, Inc. | Single phase fluid imprint lithography method |
US7122079B2 (en) | 2004-02-27 | 2006-10-17 | Molecular Imprints, Inc. | Composition for an etching mask comprising a silicon-containing material |
US7357876B2 (en) | 2004-12-01 | 2008-04-15 | Molecular Imprints, Inc. | Eliminating printability of sub-resolution defects in imprint lithography |
US7547398B2 (en) | 2006-04-18 | 2009-06-16 | Molecular Imprints, Inc. | Self-aligned process for fabricating imprint templates containing variously etched features |
Also Published As
Publication number | Publication date |
---|---|
JPS61147826A (ja) | 1986-07-05 |
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